NVIDIA’s ‘cuLitho’ Computational Lithography Adopted By TSMC and Synopsys For Production Use
Last year, NVIDIA introduced its cuLitho software library, which promises to speed up photomask development by up to 40 times. Today, NVIDIA announced a partnership with TSMC and Synopsys to implement its computational lithography platform for production use, and use the company’s next-generation Blackwell GPUs for AI and HPC applications. The development of photomasks is a…