ASML Delivers First 2nm-Generation Low-NA EUV Tool, the Twinscan NXE:3800E
Our avid readers tend to look at microelectronics made using leading edge process technologies, which in case of Intel means usage of High-NA extreme ultraviolet (EUV) lithography a couple of years down the road. But the vast majority of chips that we are going to use in the next couple of years will be made…
ASML Delivers First 2nm-Generation Low-NA EUV Tool, the Twinscan NXE:3800E Read More »